X射线多晶体衍射（XRD）

表面粗糙度对XPS测量的影响，粗糙一点的表面是不是元素含量测不准，还是没有影响？哪位大侠了解的，指教下。

When the Ra roughness become bigger, surely it will affect XPS data. One quick example aspect is "information depth".



- Just imagine the "lower" area will detect deeper and "higher" area will detect upper signal.



Actual phenomena can get much more complicated than this, but its just example and why the quick answer to your answer is:



YES, roughness will affect XPS data!!!

Thank you for you reply.

在我的样品上，有的地方出现疖状腐蚀点，有些地方是均匀腐蚀，从我测得的结果来看，在疖状腐蚀点的地方用XPS测得成分，发现在表面以及溅射100s后一直检测不到Sn；在均匀腐蚀的地方利用XPS检测在表面有Sn，在溅射20s,40s，60s后又没有检测到Sn，但是在溅射80s,100s后有检测到了Sn。

（氧化膜的粗糙度明显大于基体，相比来说，疖状斑的粗糙度又要明显大于均匀腐蚀）

考虑到数据的可靠性，我想了解到粗糙度的影响到底怎样？是不是疖状斑的地方有Sn，但是由于粗糙而检测不到，或者疖状斑的地方本来就Sn少。综合我对整个实验的把握，我更趋向于后者，但是不对粗糙的影响作点了解，说明，那就显得不太严谨。所以对这个问题还是挺纠结的。

Is the sputtering rate you used is like another question you post @ 5.01nm/min?



In this case, each 20s sputter roughly maybe removing 1.7nm. And XPS detection depth roughly is ~5-10nm say as average. So you are always detecting the XPS data in "a range".



Ra roughness level can easily be in um range. But from your description above, anyway XPS is always giving you the real Physics and your 2nd assumption seems more possible too (less Sn on particular area on sample).



If you really want to study about roughness effect, you need to actually analyze your sample to know its real roughness and then study it with XPS for different roughness how the differences would be on your samples then.



I think any direct simple "guess" from what you have now seems not very appropriate like you said.

No, the sputtering rate used in this specimen was 3.21nm/s.

But i don't konw why this rate was so high. May be it was set by the teacher?

And i think i should discuss the experiment of the roughness effect on the result with my boss.



  Thank you very much.