小中大求文献一篇,谢谢
标题:Some Illumination on the Mechanism of SiO2 Etching in HF Solutions
期刊:J. Electrochem. Soc.
卷,期,页,年:Volume 130, Issue 3, pp. 708-712 (1983)
作者:Henry Nielsen and David Hackleman
链接:cuturl('http://www.ecsdl.org/vsearch/servlet/VerityServlet?KEY=JESOAN&ONLINE=YES&smode=strresults&sort=rel&maxdisp=25&threshold=0&possible1zone=article&bool1=and&possible2=Some+Illumination+on+the+Mechanism&possible2zone=multi&OUTLOG=NO&viewabs=JESOAN&key=DISPLAY&docID=1&page=1&chapter=0')
多谢!